Past Members
Ryoichi Ishihara
Specially Appointed Associate Professor
Semiconductor devices
Research Projects
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Microstructure characterization of location-controlled Si-islands crystallized by excimer laser in the μ-Czochralski (grain filter) process(2007)
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Location- and Orientation-Controlled (100) and (110) Single-Grain Si TFTs Without Seed Substrate (2010)
1996 - 2003 | Postdoctoral, Delft University of Technology |
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2003 - 2007 | Research Associate, Delft University of Technology |
2007 - | Associate Professor, Delft University of Technology |
2016 - | Associate Professor (Specially Appointed), Institute of Innovative Research, Tokyo Institute of Technology |
2003 | Outstanding poster award, IDW (International Display Workshop) |
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2005 | Best Paper Award, The International Workshop on Active-Matrix Flat-Panel Displays (AMFPD) |
2007 | Best Paper Award, The International Workshop on Active-Matrix Flat-Panel Displays (AMFPD) |
2009 | Best Poster Award, E-MRS 2009 Spring Meeting |
2014 | Best Paper Award, ITC (International Thin-Film Transistor Conference) |
2014 | J. Zhang, M. Van Der Zwan, R. Ishihara, “Single-grain Si TFTs fabricated from sputtered si on a polyimide substrate”, IEEE/OSA Journal of Display Technology, 10 (11), (2014) art. no. 6762833, pp. 945-949 |
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2015 | Fiorentino, G., Vollebregt, S., Tichelaar, F.D., Ishihara, R., Sarro, P.M, “Impact of the atomic layer deposition precursors diffusion on solid-state carbon nanotube based super-capacitors performances”, (2015) Nanotechnology, 26 (6), art. no. 064002, |