Social Implementation
Tomoji Nakamura
Specially Appointed Professor
hin film process and characterizationSemiconductor materials, processes, and devicesLSI interconnects and reliability physics
Research Projects
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Characterized advanced materials and the interfacial structures for improving compound semiconductor device properties and LSI metallization reliabilities (1984-1999)
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Developed advanced materials for improving metallization process, such as PVD-TiN and – Al, Ti and Co silicide, and electroplated Cu (1994-2000)
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Directed and developed Cu/Low-k interconnect technologies from 90 nm to 45 nm node, and researched reliability-related failure mechanisms of Cu damascene interconnects (2000-2006)
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Directed and developed Fan-out wafer level packaging with heterogeneous devices (2007-2013)
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Developed characterization methodologies of materials and processes for 3D-stacked LSIs (2012-)
1984 | Ph. D. University of Tokyo |
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1984 - 1994 | Researcher, Fujitsu Labs. Ltd. |
1994 - 1999 | Senior Researcher, Fujitsu Labs. Ltd. |
1999 - 2006 | Director, LSI Materials Department, Fujitsu Labs. |
2007 - 2013 | Senior Vice President, Devices & Materials Labs., Fujitsu Labs. Ltd. |
2013 - 2016 | Senior Expert, Fujitsu Labs. Ltd. |
2016 - | Specially Appointed Professor, FIRST, Tokyo Tech |
2014 | Fellow, Japan Society of Applied Physics |
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2015 | SSSJ Outstanding Contribution Award, The Surface Science Society of Japan |
2009 | T. Nakamura, T. Suzuki (2009)Reliability of LSI multilayer interconnects, Oyo Buturi, 78, 873 |
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2013 | T. Nakamura (2013)Surface modification technologies: An overview, Oyo Buturi, 82, 376 |
2015 | Tadahiro Imada, Tomoji Nakamura et al. (2015), Systematic investigation of silylation materials for recovery use of low- k material plasma damage, Jpn. J. Appl. Phys., 54, 071502. |
2016 | Aki Dote, Tomoji Nakamura et al.(2016), Analyzing and modeling methods for warpages of thin and large dies with redistribution layer, Jpn. J. Appl. Phys. 55, 06JC03. |
2017 | Y. Mizushima, T. Nakamura et al. (2017), Behavior of copper contamination on backside damage for ultra-thin silicon three dimensional stacking structure, Microelectron. Eng. 167 23. |